We present a two-step method for the direct fabrication of functional three-dimensional photonic crystals in high index of refraction (n=2.45) arsenic-sulphur based thin films. Complete fabrication cycles can be as short as a few hours.
Direct laser writing of three-dimensional photonic crystals in high index of refraction chalcogenide glasses
(CLEO). Conference on Lasers and Electro-Optics, 2005. ; 2 ; 1002-1004 Vol. 2
2005-01-01
1564990 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
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