In this paper, we report on the photonic device fabrication inside silica glasses by loosely focused fs laser under the conditions of incident pulsewidth of 150 fs, incident energy of 15 /spl mu/J and effective NA of 0.007 and laser irradiation time of 10 min for each line. Diffraction gratings of 10 /spl mu/m period and waveguide splitters were fabricated by fs laser. We employed a pulsewidth tunable fs laser system based on CPA architecture which we developed and we will discuss optical properties of the fabricated devices.


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    Titel :

    Photonic device fabrication inside transparent materials by tailored femtosecond laser processing


    Beteiligte:
    Kamata, M. (Autor:in) / Obara, M. (Autor:in)


    Erscheinungsdatum :

    01.01.2003


    Format / Umfang :

    110252 byte





    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch




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