Summary form only given. Highly compact microlasers integrated on silicon, emitting in the 1.3-1.6 /spl mu/m range are important building blocks for future photonic integrated circuits that could be developed for applications such as optical interconnects. In-plane emission and low threshold are desirable for these devices, to be compatible with dense photonic integration. In this paper, we report on the fabrication of InP membrane laser micro-sources integrated on a silicon wafer, based on 2D Photonic Crystal (PC) structures. The PC consists of a triangular lattice of holes formed in the thin membrane. The basic integration procedure includes wafer scale InP transfer onto silicon via SiO/sub 2/-SiO/sub 2/ bonding and conventional nanofabrication technologies.
Membrane-based photonic crystal light sources
The 15th Annual Meeting of the IEEE Lasers and Electro-Optics Society ; 2 ; 675-676 vol.2
01.01.2002
105441 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
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