We utilize a CO/sub 2/ laser in the deposition process because SiH/sub 4/ molecules have high photon absorption of laser light. This absorption increases the decomposition of SiH/sub 4/ molecules and helps form the Si-nanostructures in low-temperature growth.
Low-temperature growth of Si-nanostructures by laser assistance of conventional plasma enhanced chemical vapor deposition
01.01.2003
82717 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
British Library Conference Proceedings | 2003
|Laser/Plasma/Chemical-Vapor Deposition Of Diamond
NTRS | 1989
|Plasma-enhanced chemical vapor deposition of zinc oxide at atmospheric pressure and low temperature
Online Contents | 2007
|