A tunable Bragg grating filter with a reflected bandwidth of 0.7 nm and a wavelength shift to temperature change of 0.1 nm//spl deg/C in the polysilane waveguides has been fabricated by a two-beam interference photobleaching method with a He-Cd laser.


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    Titel :

    Narrow band and tunable filters of a polysilane optical waveguide grating for OADM


    Beteiligte:
    Kobayashi, S. (Autor:in) / Sawada, M. (Autor:in) / Suda, T. (Autor:in) / Ogura, K. (Autor:in) / Tsushima, H. (Autor:in)


    Erscheinungsdatum :

    2005-01-01


    Format / Umfang :

    106568 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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