We describe the picosecond time-resolved measurement of the X-ray absorption fine structure in laser-melted Si by using a femtosecond laser-produced-plasma soft X-ray source and report that the Si-Si atomic distance broadened due to the melting.


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    Titel :

    Time-resolved X-ray absorption fine structure measurement of laser-melted Si with femtosecond laser-produced-plasma X-ray source


    Beteiligte:
    Oguri, K. (Autor:in) / Okano, Y. (Autor:in) / Nishikawa, T. (Autor:in) / Nakano, H. (Autor:in)


    Erscheinungsdatum :

    01.01.2005


    Format / Umfang :

    2217609 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch




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