We demonstrate an optical-gradient bottom antireflective coating film, which is prepared by a silicon nitride film treated with oxygen plasma. Results indicate that the optical-gradient type film is suitable for sub-70 nm optical lithography applications.


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    Titel :

    Optical-gradient type of antireflective coatings for sub-70 nm optical lithography applications


    Beteiligte:
    Chen, H.L. (Autor:in) / Wonder Fan, (Autor:in) / Wang, T.J. (Autor:in) / Ko, F.H. (Autor:in) / Zhai, R.S. (Autor:in) / Hsu, C.K. (Autor:in) / Chuang, T.J. (Autor:in)


    Erscheinungsdatum :

    2003-01-01


    Format / Umfang :

    70422 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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