We demonstrate an optical-gradient bottom antireflective coating film, which is prepared by a silicon nitride film treated with oxygen plasma. Results indicate that the optical-gradient type film is suitable for sub-70 nm optical lithography applications.
Optical-gradient type of antireflective coatings for sub-70 nm optical lithography applications
2003-01-01
70422 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
Optical-gradient type of antireflective coatings for sub-70 nm optical lithography applications
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