Further advances have been made in the development and understanding of an ultraviolet (UV) laser treatment of fused silica glass. Hydroxyl groups present on the surface can be removed by the treatment. The surface hydroxyl groups affect the surface adhesion and performance of silica in catalysis, chromatography, photonics and microelectronics. This work shows that dehydroxylation via laser irradiation is a thermal process. An analysis technique using mass spectrometry has been developed to elucidate and avoid the effect of hydrocarbon contamination, allowing systematic measurements of dehydroxylation to be performed.


    Zugriff

    Zugriff prüfen

    Verfügbarkeit in meiner Bibliothek prüfen

    Bestellung bei Subito €


    Exportieren, teilen und zitieren



    Titel :

    Dehydroxylation of UV fused silica slides via laser irradiation


    Beteiligte:
    Fernandes, A.J. (Autor:in) / Kane, D.M. (Autor:in) / Gong, B. (Autor:in) / Lamb, R.N. (Autor:in)


    Erscheinungsdatum :

    01.01.2002


    Format / Umfang :

    200993 byte





    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



    Dehydroxylation of UV Fused Silica Slides via UV Laser Irradiation

    Fernandes, A. J. / Kane, D. M. / Gong, B. et al. | British Library Conference Proceedings | 2002



    Fused silica reflectors in laser test

    Beller, W. | Engineering Index Backfile | 1963



    Optical Absorption in Fused Silica During Triga Reactor Pulse Irradiation

    M. A. De Crescente / F. C. Douglas / R. Gagosz et al. | NTIS | 1968