This paper presents an alternative approach in fabricating micro-optics. This approach is compatible with conventional lithographic systems and can be applied to thick and thin photoresists. The advantage of the additive lithographic process lies in the ability to sculpt the photoresist in a single processing step. This eliminates the common alignment issues by containing all alignment to the stepper system. Precise control of the exposure does produces a multilevel element, which results in micro-optic components on the substrate after a single etching step. Holographic exposures can also be combined with conventional lithography for photonic crystal applications.


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    Titel :

    Additive lithography for micro and nano-photonic applications


    Beteiligte:
    Johnson, E.G. (Autor:in) / Pitchumani, M. (Autor:in) / Brown, J.D. (Autor:in) / Hockel, H. (Autor:in) / Mohammed, W. (Autor:in)


    Erscheinungsdatum :

    2003-01-01


    Format / Umfang :

    158941 byte





    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



    Additive Lithography for Micro and Nano-Photonic Applications

    IEEE | British Library Conference Proceedings | 2003


    Additive Lithography for Micro-Optics Fabrication

    Pitchumani, M. / Hockel, H. / Sung, J. et al. | British Library Conference Proceedings | 2002


    Micro- and nano-engineering for lithography

    Hopper, C. | British Library Online Contents | 1996


    Efficient Coupling of Nano-Plasmonics to Micro-Photonic Circuitry

    Arbel, D. | British Library Conference Proceedings | 2005


    Efficient coupling of nano-plasmonics to micro-photonic circuitry

    Ginzburg, P. / Arbel, D. / Orenstein, M. | IEEE | 2005