The authors present the reactive ion beam etching (RIBE) micro fabrication of miniature photonic devices, such as micro ring lasers, corner reflector arrays and star couplers. The key issue is to develop nanometer semiconductor fabrication processes with low induced damages. The proposed concept might be helpful for the size reduction in large scale integrated photonics.


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    Titel :

    RIBE micro-fabrication of semiconductor photonic devices for micro-photonic integrated circuits


    Beteiligte:
    Koyama, F. (Autor:in) / Mitsugi, S. (Autor:in) / Kato, J. (Autor:in) / Matsutani, A. (Autor:in) / Suzuki, K. (Autor:in) / Mukaihara, T. (Autor:in) / Iga, K. (Autor:in)

    Erschienen in:

    Proceedings of LEOS'94 ; 2 ; 287-288 vol.2


    Erscheinungsdatum :

    01.01.1994


    Format / Umfang :

    368902 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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