Nanometric Zn and Al dots were deposited on a sapphire substrate with a spacing of 100 nm. Minimum diameter of fabricated Zn and Al dots were 37nm and 25nm, respectively.


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    Titel :

    In-situ lateral fabrication of zinc and aluminum nanodots by near field optical chemical vapor deposition


    Beteiligte:
    Yamamoto, Y. (Autor:in) / Kawazoe, T. (Autor:in) / Lee, G.H. (Autor:in) / Shimizu, T. (Autor:in) / Kourogi, M. (Autor:in) / Ohtsu, M. (Autor:in)


    Erscheinungsdatum :

    2001-01-01


    Format / Umfang :

    143933 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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