Prototyped XY-stages driving electron beam (EB) writing system is developed to research the possibility to write fine patterns. High density optical recording pattern with 25 Gbit/in/sup 2/ is demonstrated. It is also clear that EB writing (drawing) system has a potential to achieve a required fine pattern for 100 Gbit/in/sup 2/.


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    Titel :

    Prototyped XY stages driving EB mastering for a high density optical recording


    Beteiligte:
    Hosaka, S. (Autor:in) / Koyanagi, H. (Autor:in) / Katoh, K. (Autor:in) / Isshiki, F. (Autor:in) / Suzuki, T. (Autor:in) / Miyamoto, M. (Autor:in) / Miyauchi, Y. (Autor:in) / Arimoto, A. (Autor:in) / Nishida, T. (Autor:in)


    Erscheinungsdatum :

    01.01.2001


    Format / Umfang :

    195274 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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