We demonstrate an 860 nm high brightness non absorbing mirror ridge laser fabricated using defect induced quantum well intermixing, giving an improved catastrophic optical damage level by a factor of 2.6.
Non absorbing mirror laser with improved catastrophic optical damage level
The 15th Annual Meeting of the IEEE Lasers and Electro-Optics Society ; 2 ; 643-644 vol.2
2002-01-01
187139 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
ThC2 Non Absorbing Mirror Laser with Improved Catastrophic Optical Damage Level
British Library Conference Proceedings | 2002
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