The invention relates to an energy efficient, environmentally favorable process for the preparation of halogenated rubbers, in particular chloro- and bromobutyl rubber, that uses a common aliphatic medium of specific composition for both solution polymerization and subsequent halogenation of the rubber. More particularly, the invention relates to a process that employs a common aliphatic medium for both solution polymerization and halogenation of rubber with intermediate removal of un-reacted monomers.


    Zugriff

    Download


    Exportieren, teilen und zitieren



    Titel :

    Common solvent process for producing high molecular weight halogenated rubber


    Beteiligte:
    KREUDER CARSTEN (Autor:in) / GRONOWSKI ADAM (Autor:in) / LOVEGROVE JOHN (Autor:in) / PAUL HANNS-INGOLF (Autor:in) / FELLER ROLF (Autor:in) / WIESNER UDO (Autor:in)

    Erscheinungsdatum :

    2016-03-01


    Medientyp :

    Patent


    Format :

    Elektronische Ressource


    Sprache :

    Englisch


    Klassifikation :

    IPC:    C08F MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS , Makromolekulare Verbindungen, erhalten durch Reaktionen, an denen nur ungesättigte Kohlenstoff-Kohlenstoff-Bindungen beteiligt sind / B60C VEHICLE TYRES , Fahrzeugreifen



    COMMON SOLVENT PROCESS FOR PRODUCING HIGH MOLECULAR WEIGHT HALOGENATED RUBBER

    KREUDER CARSTEN / GRONOWSKI ADAM / LOVEGROVE JOHN et al. | Europäisches Patentamt | 2018

    Freier Zugriff


    METHOD OF PRODUCING HIGH-MOLECULAR WEIGHT HALOGENATED RUBBER USING COMMON SOLVENT

    KROJDER KARSTEN / GRONOVSKI ADAM / LAVGROV DZHON et al. | Europäisches Patentamt | 2016

    Freier Zugriff

    Halogenated wax grafted to low molecular weight polymer and rubber composition

    CHEN YAOHONG / PAN XIAO-DONG / BRUMBAUGH DENNIS R et al. | Europäisches Patentamt | 2018

    Freier Zugriff

    Halogenated wax grafted to low molecular weight polymer

    CHEN YAOHONG / PAN XIAO-DONG / BRUMBAUGH DENNIS R et al. | Europäisches Patentamt | 2020

    Freier Zugriff