A method for controlling the saturation level of gas in a liquid discharge includes obtaining temperature and pressure measurements of a solvent in a mixing vessel and obtaining a pressure measurement of a source feedstock in a feedstock tank, correlating the temperature and pressure measurements of the solvent to baseline data to generate a theoretical uptake rate for the source feedstock into the solvent and a theoretical flow rate of the source feedstock into the mixing vessel, and determining a required opening setting for a feedstock valve in the feedstock input line in order to achieve a desired liquid displacement in the mixing vessel. The method includes determining an uptake duration and achieving an uptake displacement equivalent to the reverse of the desired liquid displacement. The method includes generating a valve operating control law for how the feedstock valve should function in a cycle.


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    Titel :

    SYSTEMS AND METHODS FOR GAS DISPOSAL


    Beteiligte:

    Erscheinungsdatum :

    2021-11-25


    Medientyp :

    Patent


    Format :

    Elektronische Ressource


    Sprache :

    Englisch


    Klassifikation :

    IPC:    B01F MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING , Mischen, z.B. Lösen, Emulgieren, Dispergieren / B63G OFFENSIVE OR DEFENSIVE ARRANGEMENTS ON VESSELS , Angriffs- oder Verteidigungsanordnungen auf Schiffen / F01N GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL , Schalldämpfer oder Auspuffvorrichtungen für Gase von Kraft- und Arbeitsmaschinen oder von Kraftmaschinen allgemein / G05D SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES , Systeme zum Steuern oder Regeln nichtelektrischer veränderlicher Größen



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