The present disclosure relates to an imaging element, a manufacturing method, and an electronic apparatus which enable an image having higher image quality to be captured. In a valid pixel region in which a plurality of pixels is arranged in a matrix, a plurality of microlenses for condensing light is formed in a corresponding relation with the pixels, and in a valid pixel peripheral region which is provided so as to surround an outside of the valid pixel region, a plurality of slit type light diffraction gratings is formed such that a longitudinal direction thereof extends in a direction orthogonal to a side direction of the valid pixel region. Then, an anti-reflection film is deposited on the microlenses and the slit type light diffraction gratings. The present technology, for example, can be applied to a CMOS image sensor.


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    Titel :

    IMAGING ELEMENT, MANUFACTURING METHOD, AND ELECTRONIC APPARATUS


    Beteiligte:
    OOTSUKA YOICHI (Autor:in)

    Erscheinungsdatum :

    2019-11-14


    Medientyp :

    Patent


    Format :

    Elektronische Ressource


    Sprache :

    Englisch


    Klassifikation :

    IPC:    H01L Halbleiterbauelemente , SEMICONDUCTOR DEVICES / B60R Fahrzeuge, Fahrzeugausstattung oder Fahrzeugteile, soweit nicht anderweitig vorgesehen , VEHICLES, VEHICLE FITTINGS, OR VEHICLE PARTS, NOT OTHERWISE PROVIDED FOR / G02B Optische Elemente, Systeme oder Geräte , OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS / H04N PICTORIAL COMMUNICATION, e.g. TELEVISION , Bildübertragung, z.B. Fernsehen



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