To form a notch part, which serving as a location of alignment with a sewing margin of a second skin piece, with proper workability, in a sewing margin of a first skin piece.SOLUTION: A first notched side 41, which is pre-provided in a first skin piece 11, and a second notched side 42, which is pre-provided in a second skin piece 12, are arranged to be expanded in a folding-fan shape toward an edge end of a first sewing margin 21a, in such a manner that a first sewing margin-side tip E1 of a sewing part 14 serves as a base point. Thus, a notch part 30 is formed.SELECTED DRAWING: Figure 3

    【課題】第一表皮ピースの縫い代に、第二表皮ピースの縫い代との位置合わせ箇所となるノッチ部を作業性良く形成することにある。【解決手段】縫合部14の第一縫い代側の先端E1を基点として、第一表皮片11に予め設けられている第一切欠き辺41と、第二表皮片12に予め設けられている第二切欠き辺42とを、第一縫い代21aの縁端に向かうにつれて末広がり状に拡開して配置することによりノッチ部30を形成する。【選択図】図3


    Zugriff

    Download


    Exportieren, teilen und zitieren



    Titel :

    SKIN MANUFACTURING METHOD


    Weitere Titelangaben:

    表皮の製造方法


    Beteiligte:

    Erscheinungsdatum :

    2018-12-06


    Medientyp :

    Patent


    Format :

    Elektronische Ressource


    Sprache :

    Japanisch


    Klassifikation :

    IPC:    B60N SEATS SPECIALLY ADAPTED FOR VEHICLES , Sitze besonders für Fahrzeuge ausgebildet / A47C Stühle , CHAIRS / B68G Verfahren, Ausrüstung oder Maschinen zum Verwenden in der Polsterei , METHODS, EQUIPMENT, OR MACHINES FOR USE IN UPHOLSTERING



    SKIN AND METHOD OF MANUFACTURING SKIN

    HAYASHI KATSUYA | Europäisches Patentamt | 2018

    Freier Zugriff

    SKIN, METHOD FOR MANUFACTURING SKIN, AND LAMINATE

    NISHIMURA SHOTA | Europäisches Patentamt | 2021

    Freier Zugriff

    Manufacturing method and skin material for automobile skin

    KYU TAEK PARK | Europäisches Patentamt | 2021

    Freier Zugriff

    SEAT SKIN, SEAT AND SEAT SKIN MANUFACTURING METHOD

    KOJIMA RYOSUKE / TANAKA SOICHIRO / HITOMI TASUKU et al. | Europäisches Patentamt | 2021

    Freier Zugriff

    METHOD FOR MANUFACTURING SKIN MATERIAL, AND SKIN MATERIAL

    SATO HIROHIDE / SUZUKI SHIGEKI / HORI DAISUKE et al. | Europäisches Patentamt | 2018

    Freier Zugriff