The invention relates to a spacecraft solar sail processing method and a solar sail, and the method comprises the following steps: spin-coating a bottom layer on a silicon wafer, and spin-coating a flexible substrate film on the bottom layer; forming a first deposition region on the flexible substrate film by using a photoetching process, and depositing a film electrode in the first deposition region; forming a second deposition area on the integral structure after the deposition of the film electrodes by using a photoetching process, then depositing an alloy beam in the second deposition area, and depositing the alloy beam between two adjacent film electrodes; and forming a third deposition area on the alloy beam by using a photoetching process, depositing a reflecting beam in the third deposition area, removing photoresist and a sacrificial layer which are remained among the alloy beam, the flexible substrate film and the film electrode due to the photoetching process, and stripping the flexible substrate film from the bottom layer so that the flexible substrate film generates residual stress. The solar sail machined through the machining method is high in flexural rigidity, and a supporting mechanism is omitted.
本发明涉及一种航天器太阳帆加工方法及太阳帆,包括以下步骤:在硅片上旋涂底层,然后在底层上旋涂柔性基底薄膜;使用光刻工艺在柔性基底薄膜上形成第一沉积区,在第一沉积区内沉积薄膜电极;对完成薄膜电极沉积后的整体结构使用光刻工艺形成第二沉积区,然后在第二沉积区沉积合金梁,合金梁沉积在相邻两个薄膜电极之间;使用光刻工艺在合金梁上形成第三沉积区,在第三沉积区沉积反射梁,去除合金梁和柔性基底薄膜、薄膜电极之间因光刻工艺残留的光刻胶和牺牲层,将柔性基底薄膜从底层上剥离,以使得柔性基底薄膜产生残余应力,采用本发明的加工方法加工出的太阳帆抗弯刚度高,省去了支撑机构。
Spacecraft solar sail processing method and solar sail
一种航天器太阳帆加工方法及太阳帆
2023-07-28
Patent
Elektronische Ressource
Chinesisch
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