The invention discloses a high-energy electron radiation resistant multilayer structure shielding material and a preparation method thereof, and belongs to the technical field of space radiation protection. According to strong constraint conditions and requirements of a space radiation environment on material weight, shielding performance and the like, a multi-layer shielding design method is adopted, and a designed shielding material main body layer is formed by compounding high-Z metal tantalum and low-Z metal magnesium. When the surface density is 2g/cm<2>, the shielding performance of thelayered composite shielding material on 3.5 MeV electrons is greater than 80%. According to the invention, Ti, Cu, Al and other metal transition layers are introduced based on a metallurgical principle, and metallurgical bonding of Mg and Ta incompatible metal is achieved through the diffusion welding connection technology.

    本发明公开了属于空间辐射防护技术领域的一种抗高能电子辐射多层结构屏蔽材料及其制备方法。根据空间辐射环境对材料重量和屏蔽性能等强约束条件及要求,采用多层屏蔽的设计方法,设计的屏蔽材料主体层由高Z金属钽和低Z金属镁复合而成。当面密度为2g/cm2时,该层状复合屏蔽材料对3.5MeV电子的屏蔽性能大于80%。基于冶金学原理引入Ti、Cu、Al等金属过渡层,通过扩散焊连接技术实现了Mg、Ta互不相容金属的冶金结合。


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    Titel :

    Anti-electron-radiation multilayer structure shielding material and preparation method thereof


    Weitere Titelangaben:

    一种抗电子辐射多层结构屏蔽材料及其制备方法


    Beteiligte:
    MA SHUWANG (Autor:in) / HAN XIUZHU (Autor:in) / LYU ZHENG (Autor:in) / ZHOU AOSONG (Autor:in) / WANG JIAN (Autor:in) / YANG ZHIMIN (Autor:in) / YANG JIAN (Autor:in) / MAO CHANGHUI (Autor:in)

    Erscheinungsdatum :

    2021-04-02


    Medientyp :

    Patent


    Format :

    Elektronische Ressource


    Sprache :

    Chinesisch


    Klassifikation :

    IPC:    G21F Schutz gegen Röntgenstrahlung, Gammastrahlung, Korpuskularstrahlung oder Teilchenbeschuss , PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT / B64G Raumfahrt , COSMONAUTICS



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