The possibilities of ellipsometric method for optimization of identification of refractive index of oxynitride dielectric films have been reviewed, the possibility of ellipsometry for identification of the thickness and optical constants of metal films and semiconductor compound FeSi2.


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    Titel :

    ELLIPSOMETRIC METHODS FOR CONTROL OF PARAMETERS OF MATERIALS AND RADIOELECTRONICS STRUCTURES


    Beteiligte:
    S. Bogolyubovа (Autor:in) / E. Polyakova (Autor:in) / R. Rezvyi (Autor:in)


    Erscheinungsdatum :

    2016




    Medientyp :

    Aufsatz (Zeitschrift)


    Format :

    Elektronische Ressource


    Sprache :

    Unbekannt




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