Chemical vapor deposition (CVD) is a new technology for preparing inorganic materials which possess some advantages, such as lower preparation temperature, uniform and compact microstructure, and near-size molding, so it is one of the common methods to prepare functional ceramics. In the paper, several common chemical vapor deposition methods like atmospheric chemical vapor deposition, low-pressure chemical vapor deposition, plasma-enhanced chemical vapor deposition and laser-assisted chemical vapor deposition are reviewed, because the microstructure and performance of functional ceramics are greatly influenced by their fabrication methods. In addition, the deposition parameters of Si-C-N absorbing ceramics which are deposited at lower temperature by low-pressure chemical vapor deposition are optimized. It is proposed that low-pressure chemical vapor deposition is the main method for preparing the advanced EMW absorbing ceramics.


    Zugriff

    Download


    Exportieren, teilen und zitieren



    Titel :

    Research progress on SiCN ceramic prepared at low temperature by chemical vapor deposition


    Beteiligte:
    MU Yangyang (Autor:in) / TU Jianyong (Autor:in) / XUE Jimei (Autor:in) / YE Fang (Autor:in) / CHENG Laifei (Autor:in)


    Erscheinungsdatum :

    2019




    Medientyp :

    Aufsatz (Zeitschrift)


    Format :

    Elektronische Ressource


    Sprache :

    Unbekannt




    Synthesis and Low Temperature Magnetic Properties of Metal Elements Filled Polymer-Derived SiCN Ceramic Composites

    Yan, X. H. / Cheng, X. N. / Li, C. S. et al. | British Library Conference Proceedings | 2007




    Automatic chemical vapor deposition

    Kennedy, B. W. | NTRS | 1981


    Chemical-vapor-deposition reactor

    Chern, S. | NTRS | 1979