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    Titel :

    Illumination optics design for EUV lithography [4146-03]


    Beteiligte:

    Kongress:

    Conference, Soft x-ray and EUV imaging systems ; 2000 ; San Diego, CA



    Erscheinungsdatum :

    2000-01-01


    Format / Umfang :

    10 pages




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    Nr. 4146

    DataCite | 1925


    Trends in optical design of projection lenses for UV and EUV lithography [4146-02]

    Ulrich, W. / Beiersdorfer, S. / Mann, H.-J. et al. | British Library Conference Proceedings | 2000


    Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology [4146-04]

    Dinger, U. / Eisert, F. / Lasser, H. et al. | British Library Conference Proceedings | 2000


    Laser-generated water plasma source for extreme-ultraviolet lithography and at-wavelength interferometry [4146-11]

    Constantinescu, R. C. / Jonkers, J. / Hegeman, P. et al. | British Library Conference Proceedings | 2000


    Design, fabrication, and characterization of broadband multilayer mirrors for EUV optics at normal incidence [4146-10]

    Wang, Z. / Kun, C. / Ma, Y. et al. | British Library Conference Proceedings | 2000