Polyurethane resins as resist materials for excimer ablation lithography (EAL) [2992-19]
Meeting, Excimer lasers, optics, and applications ; 1997 ; San Jose; CA
1997-01-01
6 pages
Aufsatz (Konferenz)
Englisch
excimer lasers , SPIE , optics
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Excimer ablation lithography (EAL) for TFT-LCD (Invited Paper) [2992-16]
British Library Conference Proceedings | 1997
|Excimer laser machining of advanced materials [2992-17]
British Library Conference Proceedings | 1997
|Morphological surface change of elastomers by excimer laser ablation [2992-18]
British Library Conference Proceedings | 1997
|Excimer lasers for material ablation cross the 1.5 kHz mark (Invited Paper) [2992-01]
British Library Conference Proceedings | 1997
|Optimization of 200-W excimer laser for TFT annealing [2992-05]
British Library Conference Proceedings | 1997
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