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    Titel :

    Microfocusing 4-keV to 65-keV x rays with bent Kirkpatrick-Baez mirrors (Invited Paper) [2516-05]


    Beteiligte:
    Eng, P. J. (Autor:in) / Rivers, M. L. (Autor:in) / Yang, B. X. (Autor:in) / Schildkamp, W. (Autor:in) / Yun, W. / SPIE

    Kongress:

    Conference, X-ray microbeam technology and applcations ; 1995 ; San Diego; CA



    Erscheinungsdatum :

    1995-01-01


    Format / Umfang :

    11 pages




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




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