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    Titel :

    Optimization of measurement process variables used in radiance uniformity calibration of the emitter source for the wideband infrared scene projector (WISP) [2469-13]



    Kongress:

    Conference, Targets and backgrounds: characterization and representation ; 1995 ; Orlando; FL



    Erscheinungsdatum :

    01.01.1995


    Format / Umfang :

    14 pages


    Anmerkungen:

    Part of SPIE's "Dual-use tactical sensors program"




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    Wideband infrared scene projector (WISP) [2474-13]

    Carstens, A. M. / Stockbridge, R. G. / Dillon, J. E. et al. | British Library Conference Proceedings | 1995


    Diode-laser-based infrared scene projector [2469-65]

    Beasley, D. B. / Cooper, J. B. / Mobley, S. B. et al. | British Library Conference Proceedings | 1995


    512x512 cryovacuum resistor infrared scene projector [2469-19]

    Han, C.-J. / Cole, B. E. / Higashi, R. E. et al. | British Library Conference Proceedings | 1995


    Development of infrared semiconductor lasers for scene projector applications [2469-12]

    Torabi, A. / Harris, H. M. / SPIE | British Library Conference Proceedings | 1995


    Nonuniformity correction of, and calibrated projection with, a resistor array infrared scene projector [2469-08]

    Jones, L. E. / Olson, E. M. / Kircher, J. R. et al. | British Library Conference Proceedings | 1995