61–65 von 65 Ergebnissen
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    Advantages of a new subnanometer aspheric profiling technique with respect to the unique requirements of EUV lithography mirrors [4449-24]

    Glenn, P. E. / SPIE | British Library Conference Proceedings | 2001
    Schlagwörter: optical metrology , semiconductor industries , data storage industries

    Advanced methods for surface and subsurface defect characterization of optical components [4099-34]

    Steinert, J. / Gliech, S. / Wuttig, A. et al. | British Library Conference Proceedings | 2000
    Schlagwörter: optical metrology , semiconductor industries , data storage industries

    Accurate sizing of deposited PSL spheres from light scatter measurements [4449-19]

    Stover, J. C. / Scheer, C. A. / SPIE | British Library Conference Proceedings | 2001
    Schlagwörter: optical metrology , semiconductor industries , data storage industries

    Accuracy of the thin metallic wires diameter using Fraunhofer diffraction technique [4099-31]

    Serroukh, I. / Martinez-Anton, J. C. / Bernabeu, E. et al. | British Library Conference Proceedings | 2000
    Schlagwörter: optical metrology , semiconductor industries , data storage industries

    2D-area/3D-volume holographic optical storage nanotechnology [4099-22]

    Thomas, M. E. / SPIE | British Library Conference Proceedings | 2000
    Schlagwörter: optical metrology , semiconductor industries , data storage industries