Properties of a-SiO:H films prepared by RF glow discharge
Lowering of thickness of boron-doped microcrystalline hydrogenated silicon film by seeding technique
Promotion of microcrystallization by argon in moderately hydrogen diluted silane plasma
Characterization of undoped mc-SiO:H films prepared from (SiH4+CO2+H2)-plasma in RF glow discharge
Role of buffer layer at the p-i interface on the stabilized efficiency of a-Si solar cells
Research - The World Photovoltaic Scale: An International Reference Cell Calibration Program