Dependence of electrical field and photoresponse on multiplication region thickness for GaN APDs
Interleaved diffractive optical element design [4436-18]
Multilevel nanoscale DOE optimization, fabrication, and replication [4291-06]
All-optical integrated devices using multiquantum well disordering [2481-36]
Three-dimensional through-wafer fan-out optical interconnects [3952-42]
Three-dimensional through-wafer fan-out optical interconnects [3952-42]