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    Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology [4146-04]

    Dinger, U. / Eisert, F. / Lasser, H. et al. | British Library Conference Proceedings | 2000
    Beteiligte: Kaiser, W. M.

    Single and double spin asymmetries for deeply virtual Compton scattering measured with CLAS and a longitudinally polarized proton target

    Freier Zugriff
    Pisano, S. / Biselli, A. / Niccolai, S. et al. | BASE | 2015
    Beteiligte: Guidal, M. , Mirazita, M. , Amaryan, M. . j. , Anderson, M. . d. , Battaglieri, M. , Garçon, M. , Hattawy, M. , Holtrop, M. , Hughes, S. . m. , Maccormick, M. , Mayer, M. , Osipenko, M.

      Single and double spin asymmetries for deeply virtual Compton scattering measured with CLAS and a longitudinally polarized proton target

      Freier Zugriff
      Pisano, S. / Biselli, A. / Niccolai, S. et al. | BASE | 2015
      Beteiligte: Guidal, M. , Mirazita, M. , Amaryan, M. . j. , Anderson, M. . d. , Battaglieri, M. , Garçon, M. , Hattawy, M. , Holtrop, M. , Hughes, S. . m. , Maccormick, M. , Mayer, M. , Osipenko, M.