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AFM tip calibration using nanometer-sized structures induced by ion beam sputtering [4449-28]
Measurement of total integrated scatter of optical coatings for 157-nm lithography [4449-04]
Polarized light scattering from metallic particles on silicon wafers [4449-39]
Measurement of the elastic constants of nanometric films [4449-16]
Numerical investigation of the resolution in solid immersion lens systems [4099-28]
Present and future interference microscope systems for magnetic head metrology [4099-21]
Measurement of steep aspheres: a step forward to nanometer accuracy [4449-25]
IR spectroscopic ellipsometry for industrial characterization of semiconductors [4449-09]
Microstructure of thin films: correlation with laser damage threshold [4449-35]
Use of light scatter signals to identify particle material (Invited Paper) [4449-17]
Recent developments in spectroscopic ellipsometry for in-situ applications (Invited Paper) [4449-07]
Diffractive solid immersion lenses: characterization and manufacturing [4449-29]
Fast-scanning ellipsometry for thin film characterization [4099-39]