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Polarized light scattering from metallic particles on silicon wafers [4449-39]
Measurement of the elastic constants of nanometric films [4449-16]
AFM tip calibration using nanometer-sized structures induced by ion beam sputtering [4449-28]
Quasi-confocal extended field surface sensing [4449-23]
Automated high-accuracy measuring system for specular microreflectivity [4449-15]
Diffractive solid immersion lenses: characterization and manufacturing [4449-29]
Measurement of absorptance of optical coatings for F~2 lithography [4449-02]
Measurement of total integrated scatter of optical coatings for 157-nm lithography [4449-04]
Microstructure of thin films: correlation with laser damage threshold [4449-35]
Use of light scatter signals to identify particle material (Invited Paper) [4449-17]
Recent developments in spectroscopic ellipsometry for in-situ applications (Invited Paper) [4449-07]
Stitching interferometry of aspherical surfaces [4449-34]