Advances in optical coating and materials technology have made possible the development of instruments with substantially improved efficiency and made possible to consider more complex optical designs in the EUV. The importance of recent developments in chemical vapor deposited silicon carbide (CVD-SiC), SiC films and multilayer coatings is discussed in the context of EUV instrumentation design. The EUV performance of these coatings as well as some strengths and problem areas for their use in space will be addressed.
High reflectance coatings for space applications in the EUV
Hoch-reflektierende Schichten für Raumfahrt-Anwendungen im EUV
Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, 2 ; 384-391
1993
8 Seiten, 8 Bilder, 33 Quellen
Aufsatz (Konferenz)
Englisch
Far-Infrared Reflectance of Spacecraft Coatings
NTIS | 1966
|Far infrared reflectance of spacecraft coatings.
NTRS | 1966
|Far infrared reflectance of spacecraft coatings
AIAA | 1965
|Far infrared reflectance of spacecraft coatings.
NTRS | 1965
|Far-infrared reflectance of spacecraft coatings
NTRS | 1966
|