The oxidation of silicon, polycrystalline silicon carbide, and LPCVD silicon nitride in dissociated oxygen and N2O environments at approximately 900 deg C has been investigated. Oxidation in dissociated environments is significantly increased over oxidation in molecular environments. Deal-Grove parabolic (B) and linear (B/A) rate constants are determined for the oxidation of each material. For the times and conditions of these experiments all oxidations were diffusion rate limited, as defined by the Deal-Grove criterion t >> A2/(4B). The parabolic rate constants for SiC, Si3N4, and Si were 4180 Angström2/min, 4151 Angström2/min, and 3054 Angström2/min, respectively.


    Zugriff

    Zugriff über TIB

    Verfügbarkeit in meiner Bibliothek prüfen

    Bestellung bei Subito €


    Exportieren, teilen und zitieren



    Titel :

    The effect of dissociated oxygen on the oxidation of Si, polycrystalline SiC and LPCVD Si3N4


    Beteiligte:
    Rogers, B.R. (Autor:in) / Song, Z. (Autor:in) / Marschall, J. (Autor:in) / Queralto, N. (Autor:in) / Zorman, C.A. (Autor:in)


    Erscheinungsdatum :

    2004


    Format / Umfang :

    11 Seiten, 4 Bilder, 3 Tabellen, 19 Quellen




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch