Improved ion source produces beam of ions at any kinetic energy from 1 to 1,000 eV, with little spread in energy or angle. Such ion beams useful in studies of surface properties of materials, surface etching, deposition, and development of plasma-diagnostic instrumentation. Tandemmirror ion source uses electrostatic and magnetic fields to keep electrons in ionization chamber and assure uniform output ion beam having low divergence in energy and angle.
Tandem-Mirror Ion Source
NASA Tech Briefs ; 10 , 5
1986-09-01
Sonstige
Keine Angabe
Englisch
An RF heated tandem mirror plasma propulsion study
AIAA | 1989
|IMPROVED MIRROR SOURCE METHOD IN ROOMACOUSTICS
Online Contents | 2002
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