Reliable gold contacts are deposited on niobium by combination of RF sputtering and photolithography. Process results in structures having gold only where desired for electrical contact. Contacts are stable under repeated cycling from room temperature to 4.2 K and show room-temperature contact resistance as much as 40 percent below indium contacts made by thermalcompression bonding.


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    Titel :

    RF Sputtering of Gold Contacts On Niobium


    Beteiligte:
    Barr, D. W. (Autor:in)

    Erschienen in:

    Erscheinungsdatum :

    1983-03-01



    Medientyp :

    Sonstige


    Format :

    Keine Angabe


    Sprache :

    Englisch


    Schlagwörter :


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