Epitaxial Process for Development for Monolithic Complementary MOS-FET Structure with Oxide Barrier Isolation Final Report, 15 Mar. - 15 Sep. 1965
1965
29 pages
Report
Keine Angabe
Englisch
Manufacturing Processes & Materials Handling , Epitaxial deposition , Etching , N-type semiconductor , P-type semiconductor , Silicon , Barrier , Deposition , Effect , Epitaxy , Fet , Field , Groove , Metal , Mos , N type , Oxide , P type , Semiconductor , Transistor