In this paper, fabrication of three dimensionally integrated nano-optical structures in silicon-on-insulator (SOI) substrates using the process of separation by implantation of oxygen (SIMOX) is reported. Buried rib waveguides with lowest ever loss with the SIMOX process, reported with the fabrication of vertically integrated structures using conventional lithography and etching process, demonstrate the capability to sculpt 3-D integrated optical devices.
SIMOX sculpting of 3-D nano-optical structures
2003-01-01
225274 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
SIMOX Sculpting of 3-D Nano-optical Structures
British Library Conference Proceedings | 2003
|MC2.4 SIMOX 3-D Sculpting of Vertically-Coupled Micro Resonators in Silicon
British Library Conference Proceedings | 2004
Kraftfahrwesen | 1979
|Laser Devices for Corneal Sculpting
British Library Conference Proceedings | 1997
|