In this paper, fabrication of three dimensionally integrated nano-optical structures in silicon-on-insulator (SOI) substrates using the process of separation by implantation of oxygen (SIMOX) is reported. Buried rib waveguides with lowest ever loss with the SIMOX process, reported with the fabrication of vertically integrated structures using conventional lithography and etching process, demonstrate the capability to sculpt 3-D integrated optical devices.


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    Titel :

    SIMOX sculpting of 3-D nano-optical structures


    Beteiligte:
    Koonath, P. (Autor:in) / Kishima, K. (Autor:in) / Indukuri, T. (Autor:in) / Jalali, B. (Autor:in)


    Erscheinungsdatum :

    2003-01-01


    Format / Umfang :

    225274 byte





    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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