In case of metallic hole arrays we need to establish how structures transmit, reflect and absorb light. We fabricated hole arrays using a focused ion beam etching system (FBI DB235). The period of the array was 430/spl plusmn/5 nm, the hole diameter 250/spl plusmn/5 nm and the thickness of the silver 180/spl plusmn/5 nm. We made arrays with relatively large dimensions, 1 mm/sup 2/ so as to make the measurement of the reflectivity possible with existing facilities. We next performed optical measurements to find the transmittance and the reflectivity as a function of incident angle and incident frequency. In this way we are able to build up a map of the dispersion of the surface plasmon (SP) modes associated with the enhanced transmission.


    Zugriff

    Zugriff prüfen

    Verfügbarkeit in meiner Bibliothek prüfen

    Bestellung bei Subito €


    Exportieren, teilen und zitieren



    Titel :

    Transmission, reflection and absorption of light incident on metallic hole arrays


    Beteiligte:
    Barnes, W.L. (Autor:in) / Devaux, E. (Autor:in) / Lezec, H.J. (Autor:in) / Ebbesen, T.W. (Autor:in)


    Erscheinungsdatum :

    2003-01-01


    Format / Umfang :

    96226 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



    Effects of hole material on enhanced terahertz transmission through metallic hole arrays

    Cheng Lo, / Cho-Fan Hsieh, / Ru-Pin Pan, et al. | IEEE | 2005


    Effects of Hole Material on Enhanced Terahertz Transmission through Metallic Hole Arrays

    IEEE Lasers and Electro-optics Society | British Library Conference Proceedings | 2005


    Resonant light reflection in quadratic waveguide arrays

    Miroshnichenko, A.E. / Kivshar, Y.S. / Vicencio, R.A. et al. | IEEE | 2005



    Enhanced transmission in photonic crystal of hole arrays

    Beruete, M. / Ayza, M. Sorolla / Campillo, I. et al. | IEEE | 2006