Laser-induced backside wet etching of silica glass and sapphire plates was performed by the excitation of a liquid with a ns-pulsed UV excimer laser. Well-defined micropatterns were fabricated without debris and microcrack around the etched area. To understand the etching mechanism, the formation and propagation of shockwave and bubble were monitored by time-resolved optical microscopy at the interface between the silica glass and the liquid during etching process. Transient high-pressure as well as high-temperature generated by UV laser irradiation plays a key role in the etching process.


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    Titel :

    Surface micro-fabrication of UV transparent materials by laser-induced backside wet etching


    Beteiligte:
    Niino, H. (Autor:in) / Ding, X. (Autor:in) / Kurosaki, R. (Autor:in) / Narazaki, A. (Autor:in) / Sato, T. (Autor:in) / Kawaguchi, Y. (Autor:in)


    Erscheinungsdatum :

    2003-01-01


    Format / Umfang :

    93624 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch