High-resolution micromachining of a range of materials (polymers, fused silica, silicon, diamond) has been investigated using both short wavelength (157 nm, F/sub 2/) and short (100 fsec, Ti:Al/sub 2/O/sub 3/) pulse laser radiation. Results using the two sources are compared.


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    Titel :

    High resolution micromachining using short wavelength and short pulse lasers


    Beteiligte:
    Cashmore, J. (Autor:in) / Gower, M. (Autor:in) / Gruenewald, P. (Autor:in) / Karnakis, D. (Autor:in) / Rizvi, N. (Autor:in) / Whitfield, M. (Autor:in)


    Erscheinungsdatum :

    2001-01-01


    Format / Umfang :

    300370 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



    High Resolution Micromachining Using Short Wavelength and Short Pulse Lasers

    Cashmore, J. / Gower, M. / Gruenewald, P. et al. | British Library Conference Proceedings | 2001


    Short wavelength chemical lasers

    JEFFERS, WILLIAM Q. | AIAA | 1989


    High energy, short pulse lasers

    Fenstermacher, Charles | TIBKAT | 1976


    Short pulse generation using semiconductor lasers

    Chen, Young-Kai / Wu, Ming C. / Tanbun-Ek, Tawee et al. | SPIE | 1992