The TJNAF-FEL presents unique opportunities for the study of pulsed laser deposition due to its parameters: sub-picosecond pulses, high average power, high repetition rate and tunability. This is demonstrated through optical spectroscopy and growth of thin films.


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    Titel :

    Pulsed laser deposition with the Thomas Jefferson national accelerator facility free electron laser: benefits of sub-picosecond pulses with high repetition rate


    Beteiligte:
    Reilly, A. (Autor:in) / Allmond, C. (Autor:in) / Watson, S. (Autor:in) / Gammon, J. (Autor:in) / Kim, J.-G. (Autor:in) / Shinn, M. (Autor:in)


    Erscheinungsdatum :

    2003-01-01


    Format / Umfang :

    149386 byte



    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch





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