The charging and relaxation kinetics of pyrolytic boron nitride (BN) substrates, boron nitride with an aluminum oxide ( BN / Al 2 O 3 ) coating, and thermally annealed alumina-coated boron nitride (an– BN / Al 2 O 3 ) were investigated under low-power electron irradiation ( 5 < incident energy E 0 < 20    keV and incident flux J i = 10    nA · cm 2 at room temperature) in the CEDRE (Chambre d'Etude De Revêtements Electrisés, in French) facility at ONERA–The French Aerospace Lab. Surface potentials of each ceramics configuration were measured over time using the Kelvin probe method. The influence of coating and annealing treatments to limit charging is discussed in this paper. A thorough study of an an– BN / Al 2 O 3 sample was carried out under a critical electron flux ( E 0 = 20    keV and J i = 750    nA · cm 2 ) to assess the degradation kinetics of the material’s electrical properties. The characterizations of an– BN / Al 2 O 3 samples were performed before and after electrical aging at CIRIMAT (Centre Inter-universitaire de Recherche et d'Ingénierie des MATériaux, in French) to identify the structural and chemical evolution that would explain this degradation. A chemical deterioration of coating and some contaminants was observed after the critical irradiation.


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    Titel :

    Electrical Properties of Annealed and Coated Boron Nitride Under Electron-Beam Irradiation


    Beteiligte:
    Guerch, K. (Autor:in) / Paulmier, T. (Autor:in) / Dennison, J. R. (Autor:in) / Dekany, Justin (Autor:in) / Lenormand, P. (Autor:in) / Guillemet-Fritsch, S. (Autor:in)

    Erschienen in:

    Erscheinungsdatum :

    2016-08-09


    Format / Umfang :

    5 pages




    Medientyp :

    Aufsatz (Zeitschrift)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch






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