The high-resolution nanostructuring of Si wafer surface with 10 nm scale using a combined ion bombarding technique and chemical reaction
MACROMOLECULAR RESEARCH ; 24 , 11 ; 1014-1019
2016-01-01
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC: | 668.9 |
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Alignment technique using wafer rear surface
SPIE | 1992
|Nanostructuring repairs lithographic masks
British Library Online Contents | 2000
Toward nanostructuring with femtosecond laser pulses [5662-118]
British Library Conference Proceedings | 2004
|