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    Titel :

    Plasma etch optimization of a photosensitive benzocyclobutene (BCB) planarization layer for photonic integrated circuit manufacturing



    Kongress:

    6th, International conference on applications of photonic technology; closing the gap between theory, development, and application ; 2003 ; Quebec City, Canada



    Erscheinungsdatum :

    2003-01-01


    Format / Umfang :

    7 pages


    Anmerkungen:

    Also known as ICAPT 2003




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




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