Plasma etch optimization of a photosensitive benzocyclobutene (BCB) planarization layer for photonic integrated circuit manufacturing
6th, International conference on applications of photonic technology; closing the gap between theory, development, and application ; 2003 ; Quebec City, Canada
2003-01-01
7 pages
Also known as ICAPT 2003
Aufsatz (Konferenz)
Englisch
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Photodefinable benzocyclobutene as an optical waveguide material [2153-25]
British Library Conference Proceedings | 1994
|Fabrication of Two-Layer Microphotonic Structures without Planarization
British Library Conference Proceedings | 2005
|Thin-Film Devices Fabricated With Benzocyclobutene Adhesive Wafer Bonding
British Library Online Contents | 2005
|