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    Titel :

    Absorption measurement of DUV optical materials at 193 and 157 nm by laser-induced deflection [5188-12]



    Kongress:

    Annual conference, Advanced characterization techniques for optics, semiconductors, and nanotechnologies



    Erscheinungsdatum :

    2003-01-01


    Format / Umfang :

    10 pages




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    Absolute high-accuracy deflectometric measurement of topography [5188-39]

    Illemann, J. / International Society for Optical Engineering | British Library Conference Proceedings | 2003


    Photothermal microscopy and laser damage in optical components (Invited Paper) [5188-22]

    Commandre, M. J. / Natoli, J. Y. / Amra, C. et al. | British Library Conference Proceedings | 2003


    Low- and mid-spatial-frequency component measurement for aspheres [5188-37]

    Schulz, M. / Weingartner, I. / Elster, C. et al. | British Library Conference Proceedings | 2003


    Mueller matrix polarimeter in 157 nm [5188-18]

    Jin, L. / Kowa, H. / Otani, Y. et al. | British Library Conference Proceedings | 2003


    New magnetic semiconductor sulfospinels with cobalt [5188-47]

    Saifullaeva, D. A. / Solieva, S. F. / International Society for Optical Engineering | British Library Conference Proceedings | 2003